Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7094145
Kind Code:
B2
Abstract:
To provide a resist composition having good OoB resistance and good lithographic characteristics, and a resist pattern forming method using the resist composition.SOLUTION: The resist composition contains a compound represented by general formula (bd1) and comprising an anionic moiety and a cationic moiety. Rx-Rx, Ry-Ryand Rz-Rzeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure, provided that at least one of them has an anionic group; and Mrepresents a sulfonium or iodonium cation having a specific hydrocarbon group in which the number of benzene rings is 0-2.SELECTED DRAWING: None
Inventors:
Nguyen Cantin
Masatoshi Arai
Masatoshi Arai
Application Number:
JP2018101873A
Publication Date:
July 01, 2022
Filing Date:
May 28, 2018
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C07C309/06; C07C309/12; C07C309/17; C07D313/06; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013092618A | ||||
| JP2013015572A |
Foreign References:
| WO2016035560A1 |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida