Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7101541
Kind Code:
B2
Abstract:
A resist composition including: a compound including an anion moiety and a cation moiety and represented by the following Formula (bd1); and an organic solvent having a hydroxyl group in which Rx1 to Rx4 each represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Ry1 and Ry2 each independently represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Rz1 to Rz4 each represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; at least one of Rx1 to Rx4, Ry1 and Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an organic cation)
Inventors:
Takaya Maebashi
Komuro Yoshitaka
Komuro Yoshitaka
Application Number:
JP2018101879A
Publication Date:
July 15, 2022
Filing Date:
May 28, 2018
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C07C309/06; C07C309/12; C07C309/17; C07C381/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012098390A |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida