To provide a retainer for matter to be polished and a polishing head, relaxing the stress applied to the retainer for the matter to be polished in the process of polishing, preventing breakage and separation of the matter to be polished and the retainer for the matter to be polished, and obtaining favorable polishing result.
This retainer 1a for the matter to be polished includes: an internal retainer 3 having a holding part 5 for the matter to be polished inside; and an external retainer 2 formed on the outside of the internal retainer 3. A fixed gap 4a is provided between the internal retainer 3 and the external retainer 2, thereby solving the problem. In the retainer 1b for the matter to be polished, a buffer frame material 4b formed of a member having lower hardness than the internal retainer 3 is provided, thereby solving the problem.
MIZUMOTO HIDENOBU
KAWABATA KATSUMASA
Takeshi Sugiyama
Minetarou Hirose