Title:
RETICLE STAGE CALIBRATION INDEPENDENT OF RETICLE
Document Type and Number:
Japanese Patent JP2005101615
Kind Code:
A
Abstract:
To provide a system, an apparatus, and a method for calibrating the reticle stage of a lithographic system.
The method comprises steps of; imaging a reticle through a lithographic system; measuring a set of height offsets based on the imaged reticle; and decomposing the set of measured height offsets in accordance with a plurality of distortional factors. The present invention further comprises steps of: determining the reticle stage deformation attributes based on the distortional factors and the reticle deformation attributes; and then calibrating the reticle stage based on the stage deformation attributes.
Inventors:
WEHRENS MARTIJN GERARD DOMINIQ
LUIJTEN CARLO CORNELIS MARIA
LUIJTEN CARLO CORNELIS MARIA
Application Number:
JP2004276289A
Publication Date:
April 14, 2005
Filing Date:
September 24, 2004
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
G01B11/02; G01B11/16; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G01B11/02; G01B11/16; G03F7/20
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yutaka Yoshida
Yukio Iwamoto
Hajime Asamura
Yutaka Yoshida
Yukio Iwamoto