PURPOSE: To provide a reticle capable of high-accurately detecting rotational deviation often caused on an alignment process in the reticle used on a process for manufacturing a semiconductor integrated circuit.

CONSTITUTION: As to the reticle having a circuit pattern part 104 formed on the surface of a transparent substrate 101; an aligning detecting mark 106 is provided on the corner part of an exposure area including the circuit pattern part 104. Thus, distance between the center of the reticle and the aligning detecting mark 106 can be made longer, so that the rotational deviation obtained in the case of reticle alignment can be largely detected in proportion to that, and the deviation can be high-accurately detected with high sensitivity.