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Title:
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023001097
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having a good pattern collapse margin (PCM) to be produced, a resin, and a resist composition containing the same.SOLUTION: There are provided a salt illustrated by the following structural formula, an acid generator, a resin, and a resist composition.SELECTED DRAWING: None

Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
Application Number:
JP2022098221A
Publication Date:
January 04, 2023
Filing Date:
June 17, 2022
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D307/00; C07C381/12; C07D321/10; C08F12/24; C08F20/10; C09K3/00; G03F7/004; G03F7/039
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation



 
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