Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7220255
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern with a good shape, an acid generator, and a resist composition containing the same.SOLUTION: A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [In the formula (I), Q1 and Q2 each independently represent a fluorine atom or a C1-6 perfluoroalkyl group; Lb1 represents a C1-24 divalent saturated hydrocarbon group; -CH2- contained in the saturated hydrocarbon group may be substituted with -O- or -CO-; a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group; Ad represents an adamantanetriyl group; R1's each independently represent an organic group containing a cyclic ether structure or a hydrogen atom, provided that at least one of R1's represents an organic group containing a cyclic ether structure; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
Yoshida Isao
Higo Mutsuko
Koji Ichikawa
Higo Mutsuko
Koji Ichikawa
Application Number:
JP2021110304A
Publication Date:
February 09, 2023
Filing Date:
July 01, 2021
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D303/16; C07D305/06; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP6757234B2 | ||||
| JP2012193160A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation