Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7285144
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF).SOLUTION: The salt is represented by formula (I) [where Rrepresents a fluorine atom or the like; nn1 represents an integer of 1-5; Rrepresents a C1-8 alkyl group which may have a fluorine atom, or the like; nn2 represents an integer of 0-5; Qand Qeach independently represent a fluorine atom or the like; Lrepresents a C1-24 saturated hydrocarbon group or the like; and Yrepresents a C3-18 alicyclic hydrocarbon group which may have a substituent, or the like].SELECTED DRAWING: None
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Inventors:
Yukako Adachi
Takahiro Yasue
Koji Ichikawa
Takahiro Yasue
Koji Ichikawa
Application Number:
JP2019113567A
Publication Date:
June 01, 2023
Filing Date:
June 19, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C25/18; C07C43/225; C09K3/00; G03F7/004; G03F7/038; G03F7/20
Domestic Patent References:
| JP2006309186A | ||||
| JP2002131897A | ||||
| JP2007045144A | ||||
| JP2010175893A | ||||
| JP2013064970A | ||||
| JP2012230363A | ||||
| JP2011201866A | ||||
| JP2018005224A | ||||
| JP2017206681A | ||||
| JP2017508723A | ||||
| JP2012250964A | ||||
| JP2018043952A |
Foreign References:
| CN105884570A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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