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Title:
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2012088690
Kind Code:
A
Abstract:

To provide a resist composition which sufficiently satisfies a focus margin(DOF) in producing a resist pattern.

A resist composition comprises: a resin having a structural unit expressed by the formula(a) and a structural unit having a lactone ring; and an acid generator.


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Inventors:
ICHIKAWA KOJI
SHIMADA MASAHIKO
NISHIMURA TAKASHI
Application Number:
JP2011192478A
Publication Date:
May 10, 2012
Filing Date:
September 05, 2011
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/039; C07C309/17; C08F220/36; C09K3/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto



 
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