塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP7414500

Kind Code:

B2

Abstract:

To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), and a resist composition containing the salt.SOLUTION: The salt represented by formula (I), an acid generator, and the resist composition containing the same are provided. [In the formula, Q1 and Q2 each represent a fluorine atom, a perfluoroalkyl group or the like; R1 and R2 each represent a hydrogen atom, a fluorine atom, a perfluoroalkyl group or the like; z represents an integer of 0-6; X1 represents *-CO-O-, *-O-CO-, *-O-CO-O- or *-O-; L1 represents a single bond or a saturated hydrocarbon group; A1 represents an optionally substituted divalent alicyclic hydrocarbon group; Ra represents an optionally substituted alicyclic hydrocarbon group, and -CH2- contained in the group may be substituted with -O-, -S-, -SO2- or -CO-, provided that at least one -CH2- contained in the alicyclic hydrocarbon group is substituted with -O- or -CO-; and Z+ represents an organic cation.]SELECTED DRAWING: None

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Inventors:

Tatsuro Masuyama
Satoshi Yamamoto
Koji Ichikawa

Application Number:

JP2019222082A

Publication Date:

January 16, 2024

Filing Date:

December 09, 2019

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

C07C309/17; C07C381/12; C07D317/72; C07D321/10; C07D327/06; G03F7/004; G03F7/039; G03F7/20

Domestic Patent References:

JP2012067075A
JP2014209208A
JP2011201860A
JP2014005270A

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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