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Title:
SALT, AND RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2011121937
Kind Code:
A
Abstract:

To form a resist pattern having few defects, an excellent shape, and excellent line edge roughness.

There is disclosed a salt represented by formula (I). In the formula, Q1 and Q2 each represent F or a perfluoroalkyl group; L1 represents a single bond or a divalent saturated hydrocarbon group that may contain a substituent, provided that -CH2- thereof may be substituted with -O- or -CO-; Y1 represents a (m+1)-valent saturated cyclic hydrocarbon group, provided that -CH2- thereof may be substituted with -O-, -CO-, or -SO2-; X1 represents an aliphatic hydrocarbon group, provided that at least one of hydrogen atoms contained therein is substituted with a fluorine atom and one or more of hydrogen atoms contained therein may be substituted with a hydroxy group; m represents an integer of 1 or 2; and Z+ represents an organic counter ion.


Inventors:
ICHIKAWA KOJI
YOSHIDA ISAO
Application Number:
JP2010242476A
Publication Date:
June 23, 2011
Filing Date:
October 28, 2010
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C25/00; C07C381/12; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP2006162735A2006-06-22
JP2007161707A2007-06-28
JP2007145823A2007-06-14
JP2006306856A2006-11-09
JP2007145824A2007-06-14
JP2008074843A2008-04-03
JP2008290980A2008-12-04
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation