To form a resist pattern having few defects, an excellent shape, and excellent line edge roughness.
There is disclosed a salt represented by formula (I). In the formula, Q1 and Q2 each represent F or a perfluoroalkyl group; L1 represents a single bond or a divalent saturated hydrocarbon group that may contain a substituent, provided that -CH2- thereof may be substituted with -O- or -CO-; Y1 represents a (m+1)-valent saturated cyclic hydrocarbon group, provided that -CH2- thereof may be substituted with -O-, -CO-, or -SO2-; X1 represents an aliphatic hydrocarbon group, provided that at least one of hydrogen atoms contained therein is substituted with a fluorine atom and one or more of hydrogen atoms contained therein may be substituted with a hydroxy group; m represents an integer of 1 or 2; and Z+ represents an organic counter ion.
YOSHIDA ISAO
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