SEPARATION AND PURIFICATION OF PERFLUORO COMPOUND AND SYSTEM

Japanese Patent JP3284096

B2

PROBLEM TO BE SOLVED: To provide a new method for separating and purifying a mixture of perfluoro compounds(PFC's) to satisfy the requirement of a semiconductor manufacturing industry and overcome incompleteness of a related technique, especially a method for treating a discharged flow from a semiconductor-processing tool.
SOLUTION: This method for separating and purifying a mixture of PFC's comprises (a) a step for introducing a perfluoro compound-containing gas flow into a first distillation column, (b) a step for taking out the light product from the first distillation column and taking out the heavy product from the first distillation column, (c) a step for introducing the light product from the first distillation column to a second distillation column, (d) a step for taking out the light product from the second distillation column and taking out the heavy product from the second distillation column, (e) a step for introducing the light product of the second distillation column to a third distillation column and (f) a step for taking out the light product from the third distillation column and taking out the heavy product from the third distillation column. The method is effectively used for treatment of a waste gas from a semiconductor processing tool, and the PCF is cyclically used without discharging the PCF to the environment.

Bao Ha
Timothy Arcuri

JP688298A

May 20, 2002

January 16, 1998

Click for automatic bibliography generation  

Air Liquid America Corporation
Air Liquid Process and Construction

C07C17/38; C07C17/383; C07C19/08; F25J3/02; (IPC1-7): C07C19/08; B25J3/02; C07C17/383

JP8240382A

Takehiko Suzue (4 outside)

Previous Patent: MUSE/NTSC DOWN-CONVERTER

Next Patent: ANTIOXIDANT FUNCTION POTENTIATOR FOR LIVING BODY