Title:
Si含有膜形成材料、およびその用途
Document Type and Number:
Japanese Patent JP4333480
Kind Code:
B2
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Inventors:
Daiji Hara
Application Number:
JP2004159524A
Publication Date:
September 16, 2009
Filing Date:
May 28, 2004
Export Citation:
Assignee:
Tosoh Corporation
International Classes:
C08G83/00; C07F7/21; H01L21/312; H01L21/768; H01L23/522
Domestic Patent References:
| JP6087871A | ||||
| JP2002110670A | ||||
| JP2005530363A | ||||
| JP2005051192A |
Foreign References:
| WO2004001815A1 |