To provide a new silicon-containing alicyclic compound useful as a raw material for polysiloxane resins used for chemical amplification resists having excellent dry etching resistance, transparency to radiation, resolution, a developing property.

This silicon-containing alicyclic compound has such a structure that 2-hydroxy-(2-trifluoromethyl)ethyl group, 2-hydroxy-2-methyl-(2- trifluoromethyl)ethyl group or 2-hydroxy-2,2-di(trifluoromethyl)ethyl group and a (substituted) silyl group or cyclic polysiloxane group (the number of silicon atoms being 3-10) are bound to a bicyclo[2.2.1]heptane ring or 2-4 bicyclo[2.2.1]heptane rings-condensed ring, or a structure that the hydrogen atom(s) of the hydroxy group(s) in the above structure is (are) substituted with acid-dissociable organic group(s).