PURPOSE: To uniformly vaporize a solid material and to stably supply the vaporized material by heating the granular solid material being agitated.
CONSTITUTION: A granular solid material 44 is charged to a solid vessel 43 arranged in a thermostatic bath 45 provided with a temp. controller 46, heated and vaporized, and the vaporized material is supplied to a vacuum chamber 41 to form a thin film on a substrate 52. In this solid material vaporizer of the thin film forming device, an agitating means having an impeller 56 is arranged in the vessel 43. When the material 44 is heated, the impeller 56 is rotated by a rotating mechanism 57 to agitate the material 44. Consequently, the surface area of the material 44 being vaporized is kept constant, the amt. of the material vaporized is stabilized, and a film uniform in the depth direction is deposited.
| WO/2023/280465 | COATING PLANT FOR COATING AN OBJECT |
| WO/2008/044489 | TAKEUP TYPE VACUUM FILMING APPARATUS |
| JPS5528334 | MANUFACTURING APPARATUS FOR ULTRAFINE PARTICLE |
KITAGAWA MASATOSHI
KAMATA TAKESHI
HIRAO TAKASHI
