Title:
SOLUTION AND METHOD FOR RECOVERING PLATINUM GROUP IMPURITIES
Document Type and Number:
Japanese Patent JP3358604
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a solution and a method for recovering platinum group impurities with which platinum group metal contaminants on a semiconductor substrate surface and in a film on the substrate can be recovered conveniently and safely as well as in a high recovery rate and high precision.
SOLUTION: A mixture aqueous solution containing 10-25 weight % of HCl, 2-5 weight % of H2O2 and 0.01-2 weight % of HF or a mixture aqueous solution containing 65-82 weight % of H2SO4, 4-16 weight % of H2O2 and 0.01-2 weight % of HF is used as a solution for recovering platinum group impurities. This recovery solution is dripped on a silicon substrate surface or a film on the substrate, and all over the whole surface of the substrate is scanned so that the platinum group impurities are dissolved in the recovery solution and recovered.
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Inventors:
Kaori Watanabe
Application Number:
JP32177699A
Publication Date:
December 24, 2002
Filing Date:
November 11, 1999
Export Citation:
Assignee:
NEC
International Classes:
H01L21/308; C09K15/02; C22B3/04; C22B7/00; C22B11/00; C23F1/30; H01L21/304; H01L21/306; H01L21/3213; (IPC1-7): H01L21/308; H01L21/304
Domestic Patent References:
| JP2000315670A | ||||
| JP2000100765A | ||||
| JP8236494A | ||||
| JP11154659A | ||||
| JP3228327A |
Attorney, Agent or Firm:
Masanori Fujimaki
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