SPUTTERING DEVICE, THIN-FILM-FORMING APPARATUS, AND METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM

Japanese Patent JP2010106349

A

To provide a technology for manufacturing a magnetic recording medium, which can uniformly control temperatures of a substrate surface.

A sputtering device includes: a first-target-storing part which stores a first target 42a for forming a film on a substrate; a first heating means which is arranged so as to surround the periphery of the first target 42a and heats the substrate; and a second-target-storing part which is arranged so as to surround the periphery of the first heating means and stores a second target 43a for forming a film on the substrate.

JP2003034828	Ag ALLOY FILM FOR SHIELDING ELECTROMAGNETIC WAVE, BODY HAVING Ag ALLOY FILM FOR SHIELDING ELECTROMAGNETIC WAVE, AND SPUTTERING TARGET OF Ag ALLOY FOR SHIELDING ELECTROMAGNETIC WAVE
WO/1987/002072	APPARATUS AND PROCESS FOR ARC VAPOR DEPOSITING A COATING IN AN EVACUATED CHAMBER
JP4487223	Cr-W alloy-based sputtering target material and its manufacturing method

ABARA EINSTEIN NOEL

JP2008282383A

May 13, 2010

October 31, 2008

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CANON ANELVA CORP

C23C14/34; C23C14/14; G11B5/851

Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu

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