PURPOSE: To form a thin film having extremely high quality and performance over the wide area on a counter substrate by arranging a ferromagnetic body within the erosion ring of a target and further introducing an external magnetic field to sputter the target.
CONSTITUTION: A ferromagnetic body 2 is arranged on a part or the whole part within the erosion ring of a target 1 in magnetron sputtering, an external magnetic field is further introduced by a solenoid coil 9, and the target is sputtered to form a thin film on a parallel substrate 4. The ferromagnetic body 2 is preferably made smaller than the inscribed circle of the errosion ring, and the height of its protrusion from the target 1 surface is preferably controlled to about 1cm. Consequently, the plasma is controlled, the damage of the film deposited on the substrate is reduced, and a thin film having high quality and performance is formed over the wide area on the substrate 4.
OGAWA NOBUHIRO
MORI TAKASHI
