Title:
抵抗薄膜形成用スパッタリングターゲット、抵抗薄膜、薄膜抵抗器、およびこれらの製造方法
Document Type and Number:
Japanese Patent JP5045804
Kind Code:
B2
Abstract:
This invention provides a film resistor which exhibits excellent specific resistance, resistance-temperature characteristic, high temperature stability, as well as anti-salt water property. This invention also provides a resistor material and a method for making such a film resistor. The resistor material is constituted by a Ni-alloy containing 10 to 60 mass% of one kind or more than one kind of additive element selected from Cr, Al and Y, and a remaining portion including Ni and unavoidable imporitees, and 3 to 20 mass% of a silicate group glass as an additive to the Ni-alloy, the silicate group glass containing SiO2 as a major component and 0 to 90 mass% of one kind or more than one kind of element selected from B, Mg, Ca, Ba, Al, Zr and their oxides.
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Inventors:
Yokobayashi Sadayuki
Masahiro Sugihara
Masahiro Sugihara
Application Number:
JP2010226934A
Publication Date:
October 10, 2012
Filing Date:
October 06, 2010
Export Citation:
Assignee:
Sumitomo Metal Mining Co., Ltd.
International Classes:
H01B1/22; B22F3/14; B22F3/15; C22C1/05; C22C19/03; C22C19/05; C22C21/00; C22C27/06; C22C28/00; C22C32/00; C22F1/02; C22F1/04; C22F1/10; C22F1/11; C22F1/16; C23C14/34; H01B13/00; H01C7/00; H01C17/00; H01C17/12; C22F1/00
Domestic Patent References:
| JP58022379A | ||||
| JP58119601A | ||||
| JP63147305A | ||||
| JP2005290401A | ||||
| JP2001110602A | ||||
| JP2008007810A | ||||
| JP2006190871A | ||||
| JP2008010604A |
Attorney, Agent or Firm:
Kiwa Patent Office