Title:
STORAGE METHOD AND STORAGE CONTAINER FOR SLURRY
Document Type and Number:
Japanese Patent JP2011054906
Kind Code:
A
Abstract:
To provide a method for stably storing slurry containing quadrivalent metal hydroxide particles distributed in water without fluctuating pH.
A method for storing slurry containing water and quadrivalent metal hydroxide particles distributed in water is disclosed, wherein carbon dioxide absorbent is stored in a container without being directly brought into contact with the slurry, and it is desired that the carbon dioxide absorbent is wrapped with wrapping materials, at least partially provided with water resistance and gas permeability. This slurry is used for grinding in the planarization process of the surface of the substrate in the case of manufacturing a semiconductor element.
Inventors:
KOYAMA NAOYUKI
HOSHI YOSUKE
RYUZAKI DAISUKE
NOBE SHIGERU
HOSHI YOSUKE
RYUZAKI DAISUKE
NOBE SHIGERU
Application Number:
JP2009205086A
Publication Date:
March 17, 2011
Filing Date:
September 04, 2009
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
H01L21/304; B24B37/00; B24B57/02; C09K3/14
Attorney, Agent or Firm:
Hidekazu Miyoshi
Iwa Saki Kokuni
Kawamata Sumio
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu
Iwa Saki Kokuni
Kawamata Sumio
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu
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