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Title:
SUBSTRATE FOR FORMATION OF INTERLAYER INSULATION MATERIAL
Document Type and Number:
Japanese Patent JP2010168441
Kind Code:
A
Abstract:

To provide a polyester film suitable for a substrate to form a film interlayer insulation material, which is used for a multilayer printed wiring board manufactured using a build-up method to correspond to fine division and densification of the wiring.

This polyester film substrate for interlayer insulation is used as the substrate on which a thermosetting resin is applied to form an interlayer insulation layer, wherein a degree of thermal shrinkage of the film in a width direction after 120°C×5 min is in a range of 0-1.0%, and thickness of the film is in a range of 20-100 μm.


Inventors:
IWATA TOSHIAKI
KUNUGIHARA KAZUHIRO
Application Number:
JP2009011031A
Publication Date:
August 05, 2010
Filing Date:
January 21, 2009
Export Citation:
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Assignee:
MITSUBISHI PLASTICS INC
International Classes:
C08J5/18; H05K3/28; H05K3/46
Domestic Patent References:
JP2002252458A2002-09-06
JP2007273716A2007-10-18
JP2002307549A2002-10-23
JP2004107471A2004-04-08
JP2007177135A2007-07-12
JP2008103427A2008-05-01
JP2005292581A2005-10-20
JP2010161091A2010-07-22
Foreign References:
WO2003059995A12003-07-24