Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2023092627
Kind Code:
A
Abstract:
To prevent a liquid from being deposited to a substrate again in a case where the liquid is removed from the substrate by a processing fluid.SOLUTION: A substrate processing device comprises: a processing chamber including a processing space for processing a substrate; a support part which is stored in the processing space while supporting the substrate in a horizontal posture; a fluid supply part which causes a processing fluid to flow in a fixed direction in the processing space by supplying the processing fluid to the processing chamber; and a fluid discharge part which discharges the processing fluid from the processing chamber. The support part includes a substrate opposite surface opposed to a bottom face of the substrate and supports the substrate in a state where the substrate is separated upward from the substrate opposite surface. In a path of a layer flow of the processing fluid flowing between the substrate and the support part in the processing fluid, a downstream path positioned at a downstream side in the fixed direction is wider than an upstream path positioned at an upstream side in the fixed direction.SELECTED DRAWING: Figure 3
Inventors:
SUMI CHIKATAKE
SHIRAKAWA HAJIME
INABA MAKI
ANDO YUKITSUGU
MOTONO TOMOHIRO
SHIRAKAWA HAJIME
INABA MAKI
ANDO YUKITSUGU
MOTONO TOMOHIRO
Application Number:
JP2021207756A
Publication Date:
July 04, 2023
Filing Date:
December 22, 2021
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/304; F26B3/04; H01L21/683
Attorney, Agent or Firm:
Shoichi Swing
Kazumasa Ohnishi
Kazumasa Ohnishi
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