SUBSTRATE PROCESSOR AND SUBSTRATE PROCESSING METHOD

Japanese Patent JP2007165554

A

To secure a sufficient cleaning function while reducing damage caused on a substrate surface during cleaning.

A substrate processor is provided with long brushes 221 respectively having a bristle bundle composed of a large number of bristles; a transfer roller for transferring a substrate B to the brushes 221 in an intersecting direction with an extending direction of the brushes 221; a support mechanism which supports each brush 221 in a state that the tip 50H of the brush bristle bundle 50 of each brush 221 is directed at the downstream side, in the transfer direction of the substrate B transferred by the transfer roller, and also, in a state that the side 50F of the brush bristle bundle 50 of each brush 221 is brought into contact with the upper face of the substrate B; and processing liquid supply nozzles 231 for respectively supplying a processing liquid to the brush bristle bundle 50 of each brush 221 supported by the support mechanism.

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ODA YASUSHI
KAWANE JUNHEI
TAKEICHI YOSHIKUNI
YAMAMOTO SATOSHI
MATSUMOTO TAKAO
GOTO MASAAKI

JP2005359345A

June 28, 2007

December 13, 2005

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DAINIPPON SCREEN MFG

H01L21/304; B08B1/02

Etsushi Kotani
Takao Ito
Jiro Higuchi

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