Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SUBSTRATE TEMPERATURE MEASURING APPARATUS AND SUBSTRATE TEMPERATURE MEASUREMENT METHOD
Document Type and Number:
Japanese Patent JP2009027100
Kind Code:
A
Abstract:

To provide a substrate temperature measuring apparatus and a substrate temperature measurement method for highly accurately measuring a substrate temperature.

The substrate temperature measuring apparatus includes: a heating source 10 for heating a substrate 100; a transmission window 30 for transmitting infrared light in a wavelength region which cannot be transmitted through the substrate 100; and a thermometer 40 that includes in its sensitivity range, the wavelength region which can not be transmitted through the substrate 100, and that measures the substrate temperature of the substrate 100 by analyzing infrared light radiated from the substrate 100 heated by the heating source 10 and transmitted through the transmission window 30.


More Like This:
WO/2006/057353METHOD FOR FORMING THIN FILM, DEPOSITION SOURCE SUBSTRATE AND METHOD FOR PRODUCING THE SAME
WO/2014/010371METHOD FOR MANUFACTURING COMPOUND SOLAR CELL
JP3475637MANUFACTURE OF SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR DEVICE
Inventors:
NAKAHARA TAKESHI
KAWASAKI MASASHI
OTOMO AKIRA
TSUKASAKI ATSUSHI
Application Number:
JP2007191358A
Publication Date:
February 05, 2009
Filing Date:
July 23, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ROHM CO LTD
UNIV TOHOKU
International Classes:
H01L21/363; C23C14/54; G01J5/00
Domestic Patent References:
JPH0815180B21996-02-14
JPH0624828A1994-02-01
JP2002357481A2002-12-13
JP2002164299A2002-06-07
JP2804849B21998-09-30
JP2001324390A2001-11-22
JP2006321696A2006-11-30
Attorney, Agent or Firm:
Hidekazu Miyoshi
Keishin Terayama
Hiroyuki Miyoshi
Ichitaro Ito



 
Previous Patent: SUBSTRATE CONVEYOR

Next Patent: MULTILAYER CERAMIC CAPACITOR