SUBSTRATE TREATMENT DEVICE AND ITS MAINTAINING METHOD

Japanese Patent JP3782795

B2

PROBLEM TO BE SOLVED: To provide a substrate treatment device that can be improved in maintainability, and to provide a method of maintaining the device.
SOLUTION: The substrate treatment device 10 is provided with a main chamber 12, an opening 44 formed at the side wall of the chamber 12, and an opening/closing door 50 which opens and closes the opening 44. The device 10 is also provided with a substrate holder 32 for holding a substrate W, a sub-chamber 14 used for positioning the holder 32 in the X-direction, and a housing section 106 which can house the sub-chamber 14. In addition, the device 10 is also provided with a guiding mechanism 110 which is attachably/detachably traversed between the main chamber 12 and the housing section 106. The sub-chamber 14 is disposed adjacently to the main chamber 12 at a position at which the sub-chamber 14 is faced to the opening/closing door 50, and a driving rod 56 is attachably/detachably connected to the substrate holder 32 through a through hole 54 formed in the door 50. The driving rod 56 is constituted in a state that the rod 56 can move between the main chamber 12 and the housing section 106 by the guidance of the guiding mechanism 110 when the rod 56 is disconnected from the substrate holder 32.

Toshiharu Tanaka
Kazuki Iio

JP2003170954A

June 07, 2006

June 16, 2003

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Sumitomo Heavy Industries Ltd.

H01L21/027; H01L21/68; (IPC1-7): H01L21/027; H01L21/68

JP11297596A
JP4171715A
JP63036035U
JP10261560A

Yoshiki Hasegawa
Shiro Terasaki
Yoshiki Kuroki

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