Title:
SUBSTRATE TREATMENT TANK AND DEVICE
Document Type and Number:
Japanese Patent JP3839553
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To substitute a chemical liquid and to positively discharge particles by eliminating stagnation places of a treatment liquid.
SOLUTION: A controller 23 performs a control such that an air pressure differs alternately with time in a nearly sinusoidal curve for each of left and right air pressure adjustment type regulators 19 and 20 via each of electric air regulators 24 and 25, and a differing amounts of treatment liquid is supplied from the left and right lower sides to the center part side of a substrate 4 by a treatment liquid discharge nozzle 9 via the air pressure adjustment type regulators 19 and 20, thus changing the direction and strength of the convention of the treatment liquid in a treatment tank 3 and achieving the convention at all positions in the treatment tank 3.
Inventors:
Hiroyuki Araki
Application Number:
JP14778097A
Publication Date:
November 01, 2006
Filing Date:
June 05, 1997
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/306; H01L21/304; (IPC1-7): H01L21/304; H01L21/306
Domestic Patent References:
| JP8323118A |
Attorney, Agent or Firm:
Etsushi Kotani
Takao Ito
Takao Ito