To provide a substrate with a photocatalyst containing layer, which is used when a pattern is formed by using an action of the photocatalyst followed by energy irradiation and able to constantly keep a distance of a facing substrate of a side where the pattern is formed in forming of the pattern and the photocatalyst containing layer.

The substrate with the photocatalyst containing layer has the substrate, the photocatalyst containing layer being formed on the substrate and containing at least the photocatalyst and a spacer part, and is used so that the substrate affects the action of the photocatalyst followed by the energy irradiation of the facing substrate, which is arranged to face through the space part, to form a characteristics changing pattern changed in characteristics, wherein the spacer part is formed in a non-forming area of the characteristics changing pattern which does not contribute to forming of the characteristics changing pattern.