Title:
SURFACE PROTECTING SHEET AND METHOD FOR GRINDING SEMICONDUCTOR WAFER
Document Type and Number:
Japanese Patent JP2010027686
Kind Code:
A
Abstract:
To provide a surface protecting sheet which is prevented from being pasted on a wafer even if the surface protecting sheet contacts the wafer in positioning an opening portion of the surface protecting sheet to a bump forming portion of a semiconductor wafer, and which is pasted to the wafer by a predetermined simple means after positioning.
This surface protecting sheet, used in grinding the rear surface of the semiconductor wafer, has on one surface of a substrate sheet an opening portion having a diameter smaller than the outer diameter of the semiconductor wafer to be pasted and having no thermoplastic adhesive formed thereon, and a pasting portion including a thermoplastic adhesive layer surrounding the opening portion.
Inventors:
KUBOTA ARATA
OKUCHI SHIGETO
OKUCHI SHIGETO
Application Number:
JP2008184068A
Publication Date:
February 04, 2010
Filing Date:
July 15, 2008
Export Citation:
Assignee:
LINTEC CORP
International Classes:
H01L21/304
Domestic Patent References:
JP2005123382A | 2005-05-12 | |||
JPH0247833A | 1990-02-16 | |||
JP2002203821A | 2002-07-19 | |||
JP2000038556A | 2000-02-08 |
Attorney, Agent or Firm:
Hitoshi Maeda
Toru Suzuki
Toru Suzuki
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