To carry a substrate smoothly without causing any wear or damage on the substrate or a carrying means when the substrate is subjected to a specified liquid processing while being carried obliquely.
A substrate W is carried from a down slope carrying passage DS1 to a horizontal carrying passage LS at the inlet of a first processing stage 10 and supplied with processing liquid from a first processing liquid supply nozzle 11 during the horizontal carrying passage LS. The horizontal carrying passage LS is then switched to an up slope carrying passage US1 and the processing liquid is collected from the substrate W into the first processing stage 10. In a second processing stage 20, the substrate W is carried on a down slope carrying passage DS2 and supplied with pure water from a pure water supply nozzle 21. In a third stage 30, the substrate W is carried on an up slope carrying passage US2 and cleaning water is jetted to the surface and rear of the substrate W from cleaning water jet nozzles 31 and 32. In a fourth stage 40, state of the up slope carrying passage US2 is sustained and the surface and rear of the substrate W are dried by air knife nozzles 41 and 42 disposed above and below the substrate W on the opposite sides thereof.
KINOSHITA KAZUTO
KENMORI KAZUHIKO
| JP2000246191A | 2000-09-12 | |||
| JPH0817723A | 1996-01-19 | |||
| JPH10296200A | 1998-11-10 | |||
| JPH08321536A | 1996-12-03 | |||
| JPH01137453U | 1989-09-20 | |||
| JPH11204489A | 1999-07-30 | |||
| JPH1187210A | 1999-03-30 | |||
| JPS59204238A | 1984-11-19 | |||
| JPS6188531A | 1986-05-06 |