PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

Title:

PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

Document Type and Number:

Japanese Patent JPH0651509

Kind Code:

A

Abstract:

PURPOSE: To provide a photosensitive compsn. having reciprocity law failure characteristics, excellent photosensitive characteristics and excellent developability.

CONSTITUTION: This photosensitive compsn. consists of a water-soluble azido compd. and a polymer of a vinyl monomer having a morpholino group, e.g. acryloylmorpholine or a copolymer of a vinyl monomer having a morpholino group with a water-soluble vinyl monomer, e.g. acrylamide. This photosensitive compsn. has reciprocity law failure characteristics in the presence of oxygen and is suitable for use in the production of the black matrix of a color cathode- ray tube.

More Like This:

WO/2010/074659	3D MOLD FOR MANUFACTURE OF SUB-MICRON 3D STRUCTURES USING 2-D PHOTON LITHOGRAPHY AND NANOIMPRINTING AND PROCESS THEREOF
JPS61129647	PRODUCTION OF PHOTOMASK

Inventors:

ITO MASAHITO
UTAKA SONOKO
MORISHITA HAJIME
HAYASHI NOBUAKI
ODAKA YOSHIYUKI
NISHIZAWA SHOKO

Application Number:

JP20341892A

Publication Date:

February 25, 1994

Filing Date:

July 30, 1992

Export Citation:

Click for automatic bibliography generation Help

Assignee:

HITACHI LTD

International Classes:

G03F1/00; G03F7/004; G03F7/008; G03F7/027; G03F7/038; G03F7/30; H01J9/14; (IPC1-7): G03F7/027; G03F1/00; G03F7/004; G03F7/008; G03F7/038; G03F7/30; H01J9/14

Attorney, Agent or Firm:

Toshiyuki Usuda

Next Patent: RADIATION-CROSSLINKABLE MIXTURE AND METHOD FOR USING THE MIXTURE IN FORMATION OF RELIEF STRUCTURE ST...