Title:
MANUFACTURE OF COMPOSITE OXIDE THIN FILM
Document Type and Number:
Japanese Patent JPH0653143
Kind Code:
A
Abstract:
PURPOSE: To form a composite oxide thin film of good quality and uniform thickness regardless of a shape of a foundation.
CONSTITUTION: In a manufacturing method of a PZT thin film 28 provided to an upper surface of a silicon oxide film, a precursor is generated through hydrolysis and paly condensation of diisopropoxylead, terapropoxytitanium and tetraisopropoxyziroconium which flow into a reaction chamber together with vapor by using a CVD device 2 and then the precursor is deposited on a substrate heated to 650°C to form the crystalline PZT thin film 28.
Inventors:
KANZAWA AKIRA
Application Number:
JP20351092A
Publication Date:
February 25, 1994
Filing Date:
July 30, 1992
Export Citation:
Assignee:
ROHM CO LTD
International Classes:
H01L21/205; C23C16/40; H01L21/316; H01L41/22; (IPC1-7): H01L21/205
Attorney, Agent or Firm:
Furuya Eiko (2 outside)
Next Patent: VERTICAL FURNACE