Title:
GAS-LIQUID CONTACT METHOD AND APPARATUS
Document Type and Number:
Japanese Patent JPS5830326
Kind Code:
A
Abstract:
A method and apparatus are described for contacting a gas with a liquid by injecting gas at high tangential velocity into a contacting zone so as to form a large centrifugal force in the zone and allowing the gas to transit across a liquid inlet in the zone so that liquid is drawn into countercurrent contact with the gas. One embodiment of the apparatus consists of a closed vessel (1) having an internal baffle (5), and inlet (3) for gas or vapor injection and a gas or vapor outlet (4). The internal baffle defines an upper gas-liquid contacting zone and a lower storage zone for liquid (8). Liquid is drawn into the contacting zone through the liquid inlet dip-pipe (7) and after contact with the gas can flow back to the storage zone via the peripheral gap (6).
Inventors:
FUREDERITSUKU ROO
PIITAA NERUSON JIYAKUSON
PIITAA NERUSON JIYAKUSON
Application Number:
JP20450781A
Publication Date:
February 22, 1983
Filing Date:
December 17, 1981
Export Citation:
Assignee:
ICI LTD
International Classes:
B01D47/02; B01F5/00; B01J10/00; B01F3/04; B01J19/00; F28C3/06; (IPC1-7): B01F3/04; B01F5/00; B01J10/00
Attorney, Agent or Firm:
Kyozo Yuasa