PURPOSE: To provide deposited thin films having always a uniform thickness by providing a mask having an aperture which partially prevents the deposition on a base body surface and constituting the above device in such a manner that the base body surface can be scanned relative to the aperture of the mask.
CONSTITUTION: The base body surface (glass substrate surface) 3 is disposed to face a vapor deposition source 1 of a means for radiating a deposition material and the thin film is deposited on the base body surface (glass substrate surface) 3. The deposition having the mask 4 to partially prevent the deposition on the base body surface 3 is, thereupon, provided. This device is so constituted that the substrate can be scanned relative to the deposition mask 4. The angle formed by the base body surface 3 and the deposition 4 surface and the radiating direction 2 of the deposition material is made variable. The fine deposition pattern of the mask is obtd. in this way even with the large-area substrate.
NOMURA ICHIRO
ONO HARUTO
IWAI HISAMI
