Title:
TRANSFER METHOD AND TRANSFER DEVICE FOR SUBSTRATE
Document Type and Number:
Japanese Patent JP2016207848
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a transfer method and a transfer device that enables substrate transfer that can minimize a contact surface of a substrate and a transfer mechanism with a very simple mechanism.SOLUTION: Before a substrate 104 is supplied, a plurality of sets of pairs of rollers 105 located at an upstream end in a transfer direction are separated from each other, and when the substrate 104 is supplied, a roller movement mechanism 102 makes the plurality of sets of pairs of rollers 105 approach each other. Thereby, two sides of the substrate 104 abut on a corner of a small diameter part 105A and an end surface 105B to form such a curved state of the substrate 104 that a part of the substrate 104 which is located in the middle of the two sides is displaced upward to the two sides. A roller rotation mechanism rotates the plurality of sets of pairs of rollers 105 in such a direction that the substrate 104 is transferred in the transfer direction. The substrate 104 is transferred in a state curved by the plurality of sets of pairs of rollers 105.SELECTED DRAWING: Figure 2
Inventors:
IMAMURA TOMOHIRO
KUBO YUJI
KUBO YUJI
Application Number:
JP2015088048A
Publication Date:
December 08, 2016
Filing Date:
April 23, 2015
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
H01L21/677; B65G13/04; B65G39/18; B65G49/06
Attorney, Agent or Firm:
Shigeru Noda
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