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Title:
TREATMENT OF WASTE PHOTOGRAPHIC LIQUID
Document Type and Number:
Japanese Patent JPH05119440
Kind Code:
A
Abstract:

PURPOSE: To decrease a COD value, TOC value and ammonia nitrogen quantity at a high rate by subjecting a waste photographic liquid to wet process oxidation in the presence of a specific catalyst under the supply of oxygen, then subjecting the liquid to a biooxidation treatment by a biophase contg. ocean bacteria.

CONSTITUTION: While the waste photographic liquid is kept at a temp. from 100 to 370°C and at which the waste liquid maintains the liquid phase, the waste liquid is subjected to the wet process oxidation treatment in the presence of the catalyst deposited with at least one kind of iron, cobalt, manganese, nickel, ruthenium, rhodium, palladium, iridium, platinum, copper, gold, and tungsten, and water-in soluble or hardly soluble compds. of these metals under the supply of the gas contg. the oxygen of the quantity necessary for decomposing the ammonia and org. materials in the waste liquid (stage A). The treated water past the stage A is subjected to the biooxidation treatment by the biophase contg. the ocean bacteria in the state of contg. an inorg. salt at ≥30g per 1 liter concn. (stage B).


Inventors:
HARADA YOSHIAKI
YAMAZAKI KENICHI
TAKAHASHI ATSUKO
ISHIZUKA HIROSHI
HORI KIYOTAKA
Application Number:
JP30557491A
Publication Date:
May 18, 1993
Filing Date:
October 25, 1991
Export Citation:
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Assignee:
OSAKA GAS CO LTD
FUJI PHOTO FILM CO LTD
International Classes:
C02F1/74; C02F3/34; C02F9/00; G03C5/00; (IPC1-7): C02F1/74; C02F3/34; C02F9/00; G03C5/00
Attorney, Agent or Firm:
Tadashi Hagino (3 outside)



 
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