To provide a technique of moistening the skin by bringing the fabric having germanium deposited by sputtering into contact with the skin or by positioning it near the skin.

The fabric has the germanium or a germanium alloy deposited thereon by sputtering. For the germanium alloy, Ge-In, Ge-Sn, Ge-Ti, Ge-Fe, Ge-Si, Ge-Si-Ti, Ge-In-Ti, etc. are mentioned. The germanium content of the alloy is preferably 50 mass% or more. As for sputtering, so-called low-temperature sputtering is preferable. The low-temperature sputtering is executed by keeping a distance of about 5 cm or more from the target fabric so that the temperature of the fabric may not rise so much. The sputtering temperature is normally 50-250°C, preferably 100-180°C, and the vacuum is normally 1×10-2 to 1×10-6, preferably 1×10-3 to 1×10-5. The thickness of a sputtering film thus formed is normally 50-300 nm, preferably 80-150 nm. Sputtering may be applied to either one side of the fabric alone or both sides thereof. In the case of woven fabric, the sputtering may be conducted after fabric is woven, while fibers subjected to the sputtering may be woven into the fabric as well.