Title:
SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD OF THE SAME, AND STORAGE MEDIUM
Document Type and Number:
Japanese Patent JP2017228613
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To uniformly clean an extending part of a cup body of a liquid receptacle cup.SOLUTION: Any one of a first cup body (51) and a second cup body (52) is elevated, and both of them is closed. Then, a first gap (G1) formed between a gap formation part (5106) formed on a lower surface of a first extending part (5102) and an upper surface of a second extending part (5202) is smaller than a second gap (G2) between a part where there is not the gap formation part of a first extending part and the upper surface of a second extending part. In such a situation, a cleaning liquid is supplied to the second gap. Since the motion of the cleaning liquid that tend to flow toward an outer direction of a radial direction is limited by the narrow first gap, an entire region of a space between the first extending part and the second extending part can be filled with the cleaning liquid, and a cleaning target surface can be uniformly cleaned.SELECTED DRAWING: Figure 3
Inventors:
OGATA NOBUHIRO
ITO KIKO
TOJIMA JIRO
HASHIMOTO YUSUKE
AIURA KAZUHIRO
ITO KIKO
TOJIMA JIRO
HASHIMOTO YUSUKE
AIURA KAZUHIRO
Application Number:
JP2016122768A
Publication Date:
December 28, 2017
Filing Date:
June 21, 2016
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/304
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideyuki Mori
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideyuki Mori