ガス化デバイス、および当該ガス化デバイスのマイクロ波プラズマ減速システムを有するプラズマシャッタ

Japanese Patent JP7025815

B2

Slowing system 15 for a plasma shutter 6, where it comprises a waveguide-band transmission 16 for interconnection of the system with a generator 5, and for letting waves from the generator 5 into the plasma shutter 6, a bridge band 17 interconnected with the waveguide-band transmission 16, two parallel band waistlines 18 interconnected by its one end with the bridge band 17 and at the other end provided with a mutually separated lockable electromagnetic oscillator 20, intended for setting an exact point of reflection of a wave and for getting a maximal amplitude by count up a direct and a reflected wave, where the band waistlines 18 are flat plates, which are broadening in direction from the waveguide-band transmission 16 and narrow before the lockable electromagnetic oscillator 20, where one of its sides is provided with tenons 19 arranged side by side in distance λ_B/2 along the axis of the band waistlines 18 with orientation in a such way, that the tenons 19 arranged on the one side of the first band waistline 18 are placed in turns between the tenons 19 arranged on the one side of the second band waistline 18, where the bridge band 17 in addition attends to split a coming wave to two identical waves shifted by 180°, where each one of the waves spreads on a different band waistline 18.

Dani Renko, Anton
Fisenko, Petro
Slavik, Zubinek

JP2021543317A

February 25, 2022

January 23, 2020

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Inning S.R.O.

H05H1/42

JP2003175094A

US3814983
US5276386
WO2011034190A1

Patent business corporation HARAKENZO WORLD PATENT & TRADEMARK

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