Title:
The high poly acrylate copolymer water dispersing element of OH basis content
Document Type and Number:
Japanese Patent JP6159736
Kind Code:
B2
Abstract:
The present invention relates to aqueous secondary copolymer dispersion comprising a copolymer (P) synthesized from a mixture of free-radically polymerizable monomers (M) comprising: (M1) cycloaliphatic esters of acrylic and/or methylacrylic acid; (M3) hydroxy-functional, free-radically polymerizable monomers; (M4) carboxyl-functional, free-radically polymerizable monomers and (M5) hydroxyl- and carboxyl-free (meth)acrylic esters having C1 to C12 hydrocarbon radicals in the alcohol moiety and/or vinylaromatics, wherein the mixture further comprises polyols (PO) selected from the group of polyester polyols and/or polycarbonate polyols, the polyols having an average hydroxyl group functionality of at least 2. The invention also relates to a method for the production of such a dispersion, to the use of the dispersion as a coating and as a binder in 2K polyurethane coatings.
Inventors:
Marc Claudius Shrinner
Heinz-Dietmar Gevis
Thomas Stingle
Martin Melchiors
Heinz-Dietmar Gevis
Thomas Stingle
Martin Melchiors
Application Number:
JP2014548001A
Publication Date:
July 05, 2017
Filing Date:
December 20, 2012
Export Citation:
Assignee:
Bayer Intellectual Property GmbH
International Classes:
C08L33/00; C08G18/42; C08G18/62; C08L67/00; C09D5/00; C09D125/04; C09D133/02; C09D133/06; C09D133/14; C09D157/10; C09D167/00; C09D169/00; C09D175/04
Domestic Patent References:
JP2006249432A | ||||
JP2007321148A | ||||
JP2004162030A |
Attorney, Agent or Firm:
Makoto Ono
Kenkyo Kanayama
Mitsuaki Tsubokura
Kazuki Shigemori
Kenji Ando
Hidehiko Ichikawa
Takahiro Aoki
Yoshie Sakurada
Yousuke Kawasaki
Toshikazu Imato
Yoshikazu Iwase
Yasufumi Shiroyama
Kenkyo Kanayama
Mitsuaki Tsubokura
Kazuki Shigemori
Kenji Ando
Hidehiko Ichikawa
Takahiro Aoki
Yoshie Sakurada
Yousuke Kawasaki
Toshikazu Imato
Yoshikazu Iwase
Yasufumi Shiroyama
Previous Patent: An air filtration apparatus which has a small division without a fluid free passage
Next Patent: MANUFACTURE OF SEMICONDUCTOR DEVICE
Next Patent: MANUFACTURE OF SEMICONDUCTOR DEVICE