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Title:
A manufacturing method of a light transmittance state electric conduction film and the light transmittance state electric conduction film by which annealing treatment was carried out
Document Type and Number:
Japanese Patent JP6159490
Kind Code:
B1
Abstract:
アニール処理を短時間で行ったとしても、抵抗値を低くすることができる光透過性導電フィルムを提供する。本発明に係る光透過性導電フィルムは、光透過性及び導電性を有する導電層と、前記導電層の一方の表面側に配置されている基材とを備え、前記導電層は、インジウム・スズ酸化物の非晶質層であり、前記導電層におけるＩｎ原子とＳｎ原子との合計の含有量１００重量％中、Ｓｎ原子の含有量が７重量％以上であり、前記導電層のキャリア密度が４×１０２０／ｃｍ３以上、６×１０２０／ｃｍ３以下であり、前記導電層のホール移動度が２０ｃｍ２／Ｖ・ｓ以上、２８ｃｍ２／Ｖ・ｓ以下である。

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Inventors:
Takeshi Koyama
Kenji Masuzawa
Junnosuke Murakami
Takashi Fukuda
Application Number:
JP2016567867A
Publication Date:
July 05, 2017
Filing Date:
September 29, 2016
Export Citation:
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Assignee:
Sekisui Chemical Co.,Ltd.
International Classes:
H01B5/14; B32B7/02; B32B9/00; C23C14/08; C23C14/58; H01B13/00
Domestic Patent References:
JPH09286070A1997-11-04
JP2013207221A2013-10-07
JP2004247060A2004-09-02
JP2013152827A2013-08-08
JP2013229283A2013-11-07
JP2014148734A2014-08-21
Foreign References:
WO2013172055A12013-11-21
WO2014157312A12014-10-02
WO2011043235A12011-04-14
WO2014034575A12014-03-06
Attorney, Agent or Firm:
Patent business corporation Miya saki, table of contents patent office



 
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