Title:
A method for the design of Reticle using a two-dimensional Dawes map and charged particle beam lithography, and manufacture
Document Type and Number:
Japanese Patent JP6001040
Kind Code:
B2
Abstract:
In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on the surface is determined by combining dosage maps for a plurality of shots into the dosage map for the surface. A similar method is disclosed for fracturing or mask data preparation of a reticle image. A method for creating glyphs is also disclosed, in which a two-dimensional dosage map of one or more shots is calculated, and the list of shots and the calculated dosage map are stored for later reference.
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Inventors:
Fujimura Akira
Zeible, Harold Robert
Zeible, Harold Robert
Application Number:
JP2014245829A
Publication Date:
October 05, 2016
Filing Date:
December 04, 2014
Export Citation:
Assignee:
D2S, INC.
International Classes:
H01L21/027; G03F1/50; G03F7/20; H01J37/305
Domestic Patent References:
| JP2003347192A | ||||
| JP2003315976A | ||||
| JP2005079111A | ||||
| JP2006108447A |
Attorney, Agent or Firm:
Fukami patent office