Title:
The projection object system of a micro lithography exposure device
Document Type and Number:
Japanese Patent JP5950129
Kind Code:
B2
Abstract:
The invention concerns a projection objective of a microlithographic projection exposure apparatus designed for EUV, for imaging an object plane illuminated in operation of the projection exposure apparatus into an image plane. The projection objective has at least one mirror segment arrangement comprising a plurality of separate mirror segments. Associated with the mirror segments of the same mirror segment arrangement are partial beam paths which are different from each other and which respectively provide for imaging of the object plane (OP) into the image plane (IP). The partial beam paths are superposed in the image plane (IP). At least two partial beams which are superposed in the same point in the image plane (IP) were reflected by different mirror segments of the same mirror segment arrangement.
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Inventors:
Enquish Hartmut
Mulender stephan
Manhans-Jurgen
Flyman rolf
Mulender stephan
Manhans-Jurgen
Flyman rolf
Application Number:
JP2013537130A
Publication Date:
July 13, 2016
Filing Date:
November 03, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B13/14; G02B13/24; G02B17/08
Domestic Patent References:
| JP2005524237A | ||||
| JP2008518454A | ||||
| JP2004031954A | ||||
| JP2006352140A | ||||
| JP2009032938A | ||||
| JP2003329820A | ||||
| JP2011108974A | ||||
| JP2011501446A |
Foreign References:
| WO2009052932A1 | ||||
| DE102008041801A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi