A radiation-sensitive resin composition, a resist pattern formation method, a radiation-sensitive acid generator, and a compound

Title:

A radiation-sensitive resin composition, a resist pattern formation method, a radiation-sensitive acid generator, and a compound

Document Type and Number:

Japanese Patent JP6146329

Kind Code:

B2

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Inventors:

Ikui Junto

Application Number:

JP2014020844A

Publication Date:

June 14, 2017

Filing Date:

February 05, 2014

Export Citation:

Assignee:

JSR CORPORATION

International Classes:

G03F7/004; C07C309/19; C07C381/12; C08F20/18; C08F212/14; C09K3/00; G03F7/038; G03F7/039

Domestic Patent References:

Foreign References:

Attorney, Agent or Firm:

Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Yoshiaki Negi
Takashi Shiotani
Kenichi Fujinaka

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