A resin composition for resist lower layer film formation, a resist lower layer film, a formation method for the same, and a pattern formation method

Title:

A resin composition for resist lower layer film formation, a resist lower layer film, a formation method for the same, and a pattern formation method

Document Type and Number:

Japanese Patent JP6281490

Kind Code:

B2

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Inventors:

Masayuki Motonari
Yoshio Takimoto
Katsuhisa Mizoguchi
Hiroshi Matsumura
Shinya Nakato
Kazuhiko Kamura
Murakami Akatsuki

Application Number:

JP2014525853A

Publication Date:

February 21, 2018

Filing Date:

July 17, 2013

Export Citation:

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Assignee:

JSR CORPORATION

International Classes:

G03F7/11; C07C69/76; C07C251/68; C08G8/10; H01L21/027

Domestic Patent References:

JP2010520516A
JP2011170059A
JP2002167435A

Foreign References:

WO2009038126A1

Attorney, Agent or Firm:

Hajime Amano

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