Title:
The salt and the chemicals amplification type resist composition for acid generators
Document Type and Number:
Japanese Patent JP6021165
Kind Code:
B2
Abstract:
A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X2—Y1 group has one or more fluorine atoms, and Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
Inventors:
Koji Ichikawa
Isao Yoshida
Isao Yoshida
Application Number:
JP2010120700A
Publication Date:
November 09, 2016
Filing Date:
May 26, 2010
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/12; C07C309/17; C07C381/12; C09K3/00; G03F7/004; G03F7/039
Domestic Patent References:
| JP2006162735A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation