Title:
ACTINIC LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/054275
Kind Code:
A1
Abstract:
Provided is an actinic light sensitive or radiation sensitive resin composition that has excellent resolution and that enables the formation of a pattern having excellent LWR. Also provided are a resist film, a pattern forming method, and a method for producing an electronic device. This actinic light sensitive or radiation sensitive resin composition contains a resin and a photoacid generator. The resin contains a repeating unit containing a partial structure represented by formula (2) and at least one repeating unit selected from the group consisting of a repeating unit containing a group having a polarity that is increased by the action of an acid, a repeating unit represented by general formula (1-1), and a repeating unit represented by formula (1-2).
Inventors:
TAKADA AKIRA (JP)
KAWASHIMA TAKASHI (JP)
ASAKAWA DAISUKE (JP)
YAMAMOTO KEI (JP)
MARUMO KAZUHIRO (JP)
KAWASHIMA TAKASHI (JP)
ASAKAWA DAISUKE (JP)
YAMAMOTO KEI (JP)
MARUMO KAZUHIRO (JP)
Application Number:
PCT/JP2019/031107
Publication Date:
March 19, 2020
Filing Date:
August 07, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/038; C08F220/10; G03F7/039; G03F7/20
Foreign References:
| JP2015045702A | 2015-03-12 | |||
| JP2013151592A | 2013-08-08 | |||
| JP2009223294A | 2009-10-01 | |||
| JP2011180385A | 2011-09-15 | |||
| JPS5652404B2 | 1981-12-11 | |||
| JP2011227463A | 2011-11-10 | |||
| JP2014010436A | 2014-01-20 | |||
| JP2013113915A | 2013-06-10 | |||
| JP2013228550A | 2013-11-07 | |||
| JP2012088449A | 2012-05-10 |
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
Download PDF: