Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/133220
Kind Code:
A1
Abstract:
The present invention provides: an actinic-ray-sensitive or radiation-sensitive resin composition which has a large focus latitude and which, even when a fine pattern is formed, suppresses the collapse of the pattern; and a pattern formation method, an electronic device manufacturing method, and an electronic device using the composition. This actinic-ray-sensitive or radiation-sensitive resin composition contains a resin (P) including recurring units (i) having a radical that is decomposed by the action of an acid represented by general formula (1).
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Inventors:
GOTO AKIYOSHI (JP)
KOJIMA MASAFUMI (JP)
SHIRAKAWA MICHIHIRO (JP)
KATO KEITA (JP)
OU KEIYU (JP)
KOJIMA MASAFUMI (JP)
SHIRAKAWA MICHIHIRO (JP)
KATO KEITA (JP)
OU KEIYU (JP)
Application Number:
PCT/JP2015/053320
Publication Date:
September 11, 2015
Filing Date:
February 06, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/038; C08F22/10; G03F7/039; H01L21/027
Domestic Patent References:
| WO2012036250A1 | 2012-03-22 |
Foreign References:
| JP2014028926A | 2014-02-13 | |||
| JP2014198698A | 2014-10-23 | |||
| JP2014170167A | 2014-09-18 | |||
| JP2014145809A | 2014-08-14 | |||
| JP2012008526A | 2012-01-12 |
Attorney, Agent or Firm:
ODAHARA Shuichi et al. (JP)
Shuichi Odawara (JP)
Shuichi Odawara (JP)
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