Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/133225
Kind Code:
A1
Abstract:
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition having a large focus latitude and exceptional developability, and a pattern formation method, an electronic device manufacturing method, and an electronic device using the composition. This actinic-ray-sensitive or radiation-sensitive resin composition contains a resin (P) including recurring units (i) having a radical represented by general formula (1), and a compound generating an acid upon irradiation with an actinic ray or radiation, the compound being represented by a specific formula.
Inventors:
GOTO AKIYOSHI (JP)
KOJIMA MASAFUMI (JP)
SHIRAKAWA MICHIHIRO (JP)
KATO KEITA (JP)
KOJIMA MASAFUMI (JP)
SHIRAKAWA MICHIHIRO (JP)
KATO KEITA (JP)
Application Number:
PCT/JP2015/053449
Publication Date:
September 11, 2015
Filing Date:
February 09, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; C08F220/28; G03F7/004; G03F7/038; H01L21/027
Foreign References:
| JP2012252080A | 2012-12-20 | |||
| JP2013047790A | 2013-03-07 | |||
| JP2014035421A | 2014-02-24 | |||
| JP2012141458A | 2012-07-26 | |||
| JP2013164509A | 2013-08-22 | |||
| JP2013035942A | 2013-02-21 | |||
| JP2014238557A | 2014-12-18 |
Attorney, Agent or Firm:
ODAHARA Shuichi et al. (JP)
Shuichi Odawara (JP)
Shuichi Odawara (JP)
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