Title:
ACTIVATED GAS GENERATION DEVICE AND ACTIVATED GAS GENERATION METHOD
Document Type and Number:
WIPO Patent Application WO/2022/097361
Kind Code:
A1
Abstract:
Provided are an activated gas generation device capable of more efficient processing and a method for the same. This activated gas generation device is characterized by comprising: a plasma generation unit 1 which applies discharge to a material gas; a plasma control unit 2 which controls the plasma generation unit; a raw material gas heating unit 5 which sets the temperature of the raw material gas to a temperature higher than room temperature; a raw material gas control unit 6 for adjusting the heating temperature in the raw material gas heating unit; and an activated gas spray unit 3 which sprays an activated gas generated at the plasma generation unit.
Inventors:
NAKAMURA KENSUKE (JP)
SAMEJIMA TAKANORI (JP)
HIRAOKA TAKAHIRO (JP)
OTSUKA YUICHI (JP)
SAMEJIMA TAKANORI (JP)
HIRAOKA TAKAHIRO (JP)
OTSUKA YUICHI (JP)
Application Number:
PCT/JP2021/032770
Publication Date:
May 12, 2022
Filing Date:
September 07, 2021
Export Citation:
Assignee:
USHIO ELECTRIC INC (JP)
International Classes:
B01J19/08; H05H1/26
Foreign References:
| JP2000096247A | 2000-04-04 | |||
| JP2004323894A | 2004-11-18 | |||
| JPH08288274A | 1996-11-01 | |||
| JP2003089879A | 2003-03-28 | |||
| JP2010184197A | 2010-08-26 |
Attorney, Agent or Firm:
KIMURA Masayoshi (JP)
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