ACTIVE RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND

WIPO Patent Application WO/2019/130866

A1

Provided is an active ray- or radiation-sensitive resin composition which has excellent storage stability and can enable a pattern with excellent LWR performance to be obtained. Also provided are a resist film, a pattern forming method, a method for manufacturing an electronic device, and a compound which relate to the active ray- or radiation-sensitive resin composition. The active ray- or radiation-sensitive resin composition comprises: a resin which has a repeating unit including a group which breaks down and whose polarity increases as a result of acid action; and a compound Q represented by general formula (I).

KOJIMA MASAFUMI (JP)
UEMURA MINORU (JP)
KAWASHIMA TAKASHI (JP)
GOTO AKIYOSHI (JP)

PCT/JP2018/041981

July 04, 2019

November 13, 2018

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FUJIFILM CORP (JP)

G03F7/004; C07C63/70; C07C233/92; C07C309/17; C07C309/24; C07C309/39; C07C311/48; C07C311/51; G03F7/038; G03F7/039; G03F7/20

US20020015826A1	2002-02-07
JP2015034963A	2015-02-19

DESMARTEAU, DARRYL D ET AL.: "Iodonium zwitterions", JOURNAL OF FLUORINE CHEMISTRY, 2003, pages 57 - 61, XP004437027
JUSTIK, MICHAEL W ET AL.: "Preparation and X-ray structures of 2-[(aryl)iodonio]benzenesulfonates:novel diaryliodonium betaines", TETRAHEDRON LETTERS, vol. 50, 25 August 2009 (2009-08-25), pages 6072 - 6075, XP026602578, doi:10.1016/j.tetlet.2009.08.067

NAKASHIMA Junko et al. (JP)

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